Dear vasp users,
For the calculation of conductor and semiconductor composite, which smearing method should I use to optimize the geometry?
I want to construct ZnTe(semiconductor) on the Ti3C2(conductor) layer.
If I optimize a slab composed of above composite with ISMEAR=0, then I also have to optimize the Ti3C2 bulk structure with ISMEAR=0 before constructing the slab, although it is metallic material?
Thank you for the help.
Regards.
Smearing method of metal and semiconductor composite
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Re: Smearing method of metal and semiconductor composite
Hi,
Thanks for posting on the VASP forum. The Gaussian smearing method (ISMEAR=0) is suitable for both metals and semiconductors/insulators. However, it does require a careful choice of SIGMA. When you perform geometry optimization on the individual materials, you can follow the recommendations on the ISMEAR wiki page.
Thanks for posting on the VASP forum. The Gaussian smearing method (ISMEAR=0) is suitable for both metals and semiconductors/insulators. However, it does require a careful choice of SIGMA. When you perform geometry optimization on the individual materials, you can follow the recommendations on the ISMEAR wiki page.
Manuel
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Re: Smearing method of metal and semiconductor composite
Thank you for the reply!